发明名称 COMPOSITION FOR HARDMASK, METHOD OF FORMING PATTERNS USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
摘要 A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
申请公布号 US2014335447(A1) 申请公布日期 2014.11.13
申请号 US201214368858 申请日期 2012.11.23
申请人 Lee Sung-Jae;Moon Joon-Young;Cho Youn-Jin;Kim Young-Min;Yoon Yong-Woon 发明人 Lee Sung-Jae;Moon Joon-Young;Cho Youn-Jin;Kim Young-Min;Yoon Yong-Woon
分类号 G03F1/00;G03F7/20 主分类号 G03F1/00
代理机构 代理人
主权项 1. A composition for a hardmask, the composition comprising: a copolymer including repeating units represented by the following Chemical Formulae 1 and 2; and a solvent: wherein, in Chemical Formulae 1 and 2, R1 is a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, or a substituted or unsubstituted C6 to C30 arylene group, R2 to R4, R5 to R14, R18, and R19 are each independently hydrogen, a hydroxyl group, an amino group, a thiol group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C3 to C20 cycloalkenyl group, a substituted or unsubstituted C3 to C20 cycloalkynyl group, a substituted or unsubstituted C2 to C20 heterocycloalkyl group, a substituted or unsubstituted C2 to C20 heterocycloalkenyl group, a substituted or unsubstituted C2 to C20 heterocycloalkynyl group, or a substituted or unsubstituted C6 to C30 aryl group, provided that at least one of R5 to R14 is a hydroxyl group, an amino group, or a thiol group, and R18 and R19 include at least one hydroxyl group, respectively, R15 and R16 are each independently a substituted or unsubstituted C6 to C30 arylene group, R20 to R25 are each independently a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C2 to C20 alkenylene group, a substituted or unsubstituted C2 to C20 alkynylene group, or a substituted or unsubstituted C6 to C30 arylene group, n2 to n4 are each independently integers that satisfy the following relations: 0≦n2≦2, 0≦n3≦3 and 0≦n4≦4, n5 and n6 are each independently integers ranging from 1 to 10, n7 to n10 are each independently integers ranging from 0 to 10, x and y are each independently integers that satisfy the following relations: x+y=1, 0≦x≦1, and 0≦y≦1, n and m are each independently integers ranging from 1 to 200, and *1 to *4 are binding sites to another repeating unit or terminal group.
地址 Uiwang-si KR