发明名称 Radiation Source
摘要 A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive a first amount of radiation (205) such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location. The first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation (132). The radiation source further comprises an alignment detector having a first sensor arrangement (122) and a second sensor arrangement (134). The first sensor arrangement is configured to measure a property of a third amount of radiation (205a) that is indicative of a focus position of the first amount of radiation. The second sensor arrangement is configured to measure a property of a fourth amount of radiation (138), the fourth amount of radiation being a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.
申请公布号 US2014333915(A1) 申请公布日期 2014.11.13
申请号 US201214361145 申请日期 2012.11.02
申请人 ASML Netherlands B.V. 发明人 Hoogkamp Jan Frederik;Jansen Bastiaan Stephanus Hendricus;Wijckmans Maurice Willem Jozef Etiënne
分类号 G03F7/20;H01J37/32 主分类号 G03F7/20
代理机构 代理人
主权项 1. A radiation source suitable for providing a beam of radiation to an illuminator of a lithographic apparatus, the radiation source comprising: a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; the radiation source configured to receive a first amount of radiation such that; the first amount of radiation is incident on a fuel droplet at the plasma formation location; the radiation source further comprising an alignment detector having a first sensor arrangement and a second sensor arrangement; the first sensor arrangement configured to measure a property of a third amount of radiation that is indicative of a focus position of the first amount of radiation; and the second sensor arrangement configured to measure a property of a fourth amount of radiation, the fourth amount of radiation comprising a portion of the first amount of radiation that is reflected by the fuel droplet upon which the first amount of radiation is incident.
地址 Veldhoven NL