METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE

摘要

A method of manufacturing a color filter substrate includes forming a plurality of trenches having a predetermined depth by etching a surface of a transparent substrate, disposing a color filter material in the plurality of trenches to form a color filter layer, and forming a transparent electrode on the transparent substrate including the color filter layer therein.

主权项

1. A method of manufacturing a thin film transistor, comprising:
forming a signal line section on a base substrate to define a plurality of pixel areas; etching the base substrate using the signal line section as a mask to form a plurality of trenches on the base substrate, the plurality of trenches corresponding to the pixel areas, respectively; disposing a color filter material in each trench by using an inkjet printing method to form a color filter layer; forming an organic layer on the color filter layer and the signal line section; forming a thin film transistor on the organic layer; and forming a pixel electrode electrically connected to the thin film transistor.