Reflective Lithography Masks and Systems and Methods

摘要

Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.

主权项

1. A system comprising:
a first radiation source; and a first lithography mask comprising a first non-planar reflective surface and a first reticle pattern, the first lithography mask being configured to reflect radiation off of the first non-planar reflective surface in a first pattern of radiation to a substrate, the radiation being from the radiation source, the first pattern of radiation corresponding to the first reticle pattern.