发明名称 MICROLITHOGRAPHY PROJECTION OBJECTIVE
摘要 Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
申请公布号 US2014333913(A1) 申请公布日期 2014.11.13
申请号 US201414337475 申请日期 2014.07.22
申请人 Carl Zeiss SMT GmbH 发明人 Feldmann Heiko;Kraehmer Daniel;Perrin Jean-Claude;Kaller Julian;Dodoc Aurelian;Kamenov Vladimir;Conradi Olaf;Gruner Toralf;Okon Thomas;Epple Alexander
分类号 G03F7/20;G02B17/08 主分类号 G03F7/20
代理机构 代理人
主权项 1. A projection objective, comprising: a plurality of optical elements configured to image a pattern in an object plane along a light path through the projection objective into an image plane, the plurality of optical elements comprising first optical element; a first stop; and a second stop, wherein: along the light path, the only optical element between the first and second stops is the first optical element; andthe projection objective is a microlithography projection objective.
地址 Oberkochen DE