发明名称 |
MICROLITHOGRAPHY PROJECTION OBJECTIVE |
摘要 |
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. |
申请公布号 |
US2014333913(A1) |
申请公布日期 |
2014.11.13 |
申请号 |
US201414337475 |
申请日期 |
2014.07.22 |
申请人 |
Carl Zeiss SMT GmbH |
发明人 |
Feldmann Heiko;Kraehmer Daniel;Perrin Jean-Claude;Kaller Julian;Dodoc Aurelian;Kamenov Vladimir;Conradi Olaf;Gruner Toralf;Okon Thomas;Epple Alexander |
分类号 |
G03F7/20;G02B17/08 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
|
主权项 |
1. A projection objective, comprising:
a plurality of optical elements configured to image a pattern in an object plane along a light path through the projection objective into an image plane, the plurality of optical elements comprising first optical element; a first stop; and a second stop, wherein:
along the light path, the only optical element between the first and second stops is the first optical element; andthe projection objective is a microlithography projection objective. |
地址 |
Oberkochen DE |