| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection device capable of inspecting a fine pattern having resolution less than a resolution limit, and a pattern defect having a size that can be sufficiently resolved.SOLUTION: A pattern inspection device comprises: an optical image acquisition part 150 that acquires an optical image of a plurality of dies of a sample to be inspected in which the plurality of dies having the same pattern formed therein are arranged; a sub-frame division part 64 that divides the optical image of the die positioned in a non-resolution pattern area into a plurality of sub-optical images by using non-resolution pattern area information capable of discriminating the non-resolution pattern area having the non-resolved non-resolution pattern formed therein; a sub-frame comparison part 66 that compares a plurality of sub-optical images obtained by dividing the optical image of the same die with each other for each pixel; and a frame comparison part 68 that compares the optical images of the different dies with each other for each pixel. |
