PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

摘要

There is provided a plasma processing apparatus which can improve density uniformity of plasma excited by a high frequency wave as in the VHF frequency band and reduce production costs by downsizing for a substrate having a large size. The plasma processing apparatus includes a waveguide member defining a waveguide, first and second electrodes disposed so as to face a plasma formation space, defining the waveguide in cooperation with the waveguide member, and electrically connected to the waveguide member; a coaxial tube supplying electromagnetic energy into the waveguide; a dielectric plate disposed in the waveguide and extending in a longitudinal direction; and first and second conductors disposed, in the waveguide, on at least one side of the waveguide in a width direction with respect to the dielectric plate, extending along the dielectric plate, and electrically connected to the first and second electrodes.

主权项

1. A plasma processing apparatus comprising:
a waveguide member configured to define a waveguide having a rectangular cross section in a direction crossing a longitudinal direction; first and second electrodes for electric field formation disposed so as to face a plasma formation space, defining the waveguide in cooperation with the waveguide member, and electrically connected to the waveguide member; a transmission path configured to supply electromagnetic energy from a predetermined power supply position in the longitudinal direction into the waveguide; a dielectric plate disposed in the waveguide and extending in the longitudinal direction; and at least one conductor disposed, in the waveguide, on at least one side of the waveguide in a width direction with respect to the dielectric plate, extending along the dielectric plate, and electrically connected to one of the first and second electrodes.