DEVICE AND METHOD FOR TREATING SUBSTRATE SURFACES

摘要

A device and method for treatment of a substrate treatment surface of a substrate with a fluid by immersion of the substrate treatment surface into the fluid, The device includes:
receiving means for receiving the fluid with an immersion opening andimmersion means for immersion of the substrate treatment surfacesthrough the immersion opening into the receiving means,

Rotation means are provided for rotation of the receiving means for at least predominant discharge of the fluid from the receiving means.