| 摘要 |
<p>PROBLEM TO BE SOLVED: To achieve downsizing and improved throughput of an apparatus, and make it possible to correspond to an arrangement of a substrate delivery part of a different exposure device.SOLUTION: A substrate processing apparatus comprises: a processing block including a coating treatment part and a development processing part of a plurality of laminated substrates; an exposure block S4 including an exposure processing part of the substrates; and an interface block S3 connected to the processing block, for connecting the processing block and the exposure block, in which the interface block includes a shelf unit U6 in which buffer parts BF for standby of the substrates are stacked, and a first substrate transfer mechanism 60A and a second substrate transfer mechanism 60B which are arranged on both sides of the shelf unit and which are made in a manner such that both are capable of delivering a substrate with respect to the shelf unit and one of the mechanisms is capable of delivering a substrate with respect to the exposure block.</p> |
