| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pellicle which does not cause separation to a large number of fragments even when being damaged by an impact and thereby reduces influence of the impact on a mask pattern and an exposure device and its production method.SOLUTION: A pellicle is based on silicon, and has a silicon oxide layer 90 on at least one side of an SOI substrate 100 forming the pellicle and a reinforcing member composed of a ductile and malleable reinforcing material 60 on the silicon oxide layer 90.</p> |
