发明名称 |
SEED CRYSTAL SUBSTRATE FOR GROWING SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a silicon carbide seed crystal substrate capable of growing a silicon carbide single crystal ingot having high quality by a sublimation recrystallization method.SOLUTION: A lid inner surface 4a of a crucible 3 and a mounting surface 1a of a seed crystal substrate 1 mounted on the lid inner substrate are flattened so as to be an average roughness (Ra) of 5 μm or less. When the lid inner surface or a measuring surface having the same flatness as the lid inner surface is used as a reference plane and the mounting surface of the seed crystal substrate is left on the reference plane, a distance h between the reference plane and a point 11 where a perpendicular from the reference plane is contacted with the outer peripheral side 1b of the seed crystal substrate is 0.1 mm or less. The seed crystal substrate for growing a silicon carbide single crystal can prevent thermal decomposition generated from a gap 10 between the lid inner surface of the crucible and the mounting surface of the seed crystal substrate and manufacture a silicon carbide single crystal ingot having high quality. |
申请公布号 |
JP2014210687(A) |
申请公布日期 |
2014.11.13 |
申请号 |
JP20130088695 |
申请日期 |
2013.04.19 |
申请人 |
NIPPON STEEL & SUMITOMO METAL |
发明人 |
USHIO MASASHI;YANO TAKAYUKI;FUJIMOTO TATSUO;HIRANO YOSHIO;TSUGE HIROSHI;KATSUNO MASAKAZU;YASHIRO HIROKATSU;SATO SHINYA |
分类号 |
C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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