| 摘要 |
PROBLEM TO BE SOLVED: To provide a photocurable resin composition for forming a fine structure for forming a cured product which has antistatic properties, and has excellent yellowing resistance and substrate adhesion while having long-term reliability, and to provide a cured product thereof.SOLUTION: A photocurable resin composition for forming a fine structure contains (A) urethane (meth)acrylate, (B) orthophenyl phenoxyethyl (meth)acrylate, (C) ethylene oxide-modified and/or propylene oxide-modified bisphenol A di(meth)acrylate, (D) a photopolymerization initiator, (E) an antistatic agent containing lithium salt, and (F) a phenolic antioxidant containing a specific structure. |
