| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a nano-silicon material that has large specific surface area and has a reduced content of SiO.SOLUTION: The nano-silicon material is manufactured by subjecting a layered polysilane produced by reacting an acid with calcium disilicide to heat treatment. The layered polysilane used has peaks at a Raman shift of 341±10 cm, 360±10 cm, 498±10 cm, 638±10 cmand 734±10 cmon a Raman spectrum.</p> |
