| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma light source and a method for generating plasma light capable of stably generating plasma light for EUV irradiation over a long period of time of the order of a μsec. <P>SOLUTION: The plasma light source comprises a plurality of coaxial electrode pairs 10 comprising a pair of coaxial electrodes 11 facing each other and confining plasma 3 in the axial direction at a middle position 11a between the coaxial electrodes, a discharge-environment maintaining device 20 supplying each coaxial electrode pair 10 with a plasma medium and maintaining each coaxial electrode pair at temperatures and pressure suitable for plasma generation, and a voltage applying device 30 applying discharge voltages of opposite polarity to each coaxial electrode of each coaxial electrode pair. The plurality of coaxial electrode pairs 10 intersects at the middle position 11a, and the voltage applying device 30 applies discharge voltages of different phase to the coaxial electrodes 11 of each coaxial electrode pair 10. <P>COPYRIGHT: (C)2012,JPO&INPIT |
