| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetron sputtering cathode, which includes a magnetism generating mechanism, in which an intermediate magnetic pole is arranged between a center magnetic pole and an outer peripheral magnetic pole, and reduces local erosion of a sputtering target and largely improves usage efficiency. SOLUTION: The magnetic flux density of a target surface is adjusted such that the consecutive length, in which perpendicular magnetic flux density from the center magnetic pole 12 to the end part of the target is within a range of -50 to +50 gauss in a region A, is set to be 0.07 time or more the short side length. Further, a minimum value of an absolute value of horizontal magnetic flux density from the center magnetic pole 12 to the target end part at the center in the long side direction of the region A is set in a range of 0.95-1.4 time the minimum value of the absolute value of the horizontal magnetic flux density at both the ends, and the absolute value of the horizontal magnetic flux density of the center magnetic pole 12 at the center in the short side direction of a region B is set to be 0.4 time or below the absolute value of the perpendicular magnetic flux density. COPYRIGHT: (C)2013,JPO&INPIT |
