发明名称 半導体素子、及びその製造方法
摘要 <p>Provided is a semiconductor device which has excellent long-term reliability and has less yield deterioration due to semiconductor element breakage caused by heat application during assembly.  The semiconductor device is provided with: a semiconductor substrate; an electrode terminal formed on one surface of the semiconductor substrate; a hole formed on the semiconductor substrate at a position which corresponds to the electrode terminal from at least the surface opposite to the surface having the electrode terminal thereon; a heat transfer body which is embedded in the hole and is composed of a material having a heat conductivity higher than that of the material of the semiconductor substrate; and an IR absorbing film which is formed at least on a part of the heat transfer body surface opposite to the heat transfer body surface on the electrode terminal side and is composed of a material having an infrared ray absorbability higher than that of the material of the semiconductor substrate.</p>
申请公布号 JP5621593(B2) 申请公布日期 2014.11.12
申请号 JP20100518007 申请日期 2009.06.22
申请人 发明人
分类号 H01L21/60;H01L21/3205;H01L21/768;H01L23/522 主分类号 H01L21/60
代理机构 代理人
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