发明名称 半導体装置、リソグラフィ方法、及び半導体装置の製造方法
摘要 A semiconductor device includes an alignment mark. A probe beam is scanned on the alignment mark so as to detect a position coordinate of the alignment mark, and the alignment mark comprises a plurality of bar marks which are arranged in a first predetermined interval along a first direction of scanning the detection beam. Each of the plurality of bar marks comprises a plurality of interconnection marks which are arranged along a second direction orthogonal to the first direction, and a first space between adjacent two of the plurality of interconnection marks is shorter than a wavelength of the detection beam within a range of a design constraint.
申请公布号 JP5623033(B2) 申请公布日期 2014.11.12
申请号 JP20090148386 申请日期 2009.06.23
申请人 发明人
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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