发明名称 バイポーラ・トランジスタの製造方法
摘要 <p>Bipolar transistor structures, methods of designing and fabricating bipolar transistors, methods of designing circuits having bipolar transistors. The method of designing the bipolar transistor includes: selecting an initial design of a bipolar transistor; scaling the initial design of the bipolar transistor to generate a scaled design of the bipolar transistor; determining if stress compensation of the scaled design of the bipolar transistor is required based on dimensions of an emitter of the bipolar transistor after the scaling; and if stress compensation of the scaled design of the bipolar transistor is required then adjusting a layout of a trench isolation layout level of the scaled design relative to a layout of an emitter layout level of the scaled design to generate a stress compensated scaled design of the bipolar transistor.</p>
申请公布号 JP5623519(B2) 申请公布日期 2014.11.12
申请号 JP20120517547 申请日期 2010.06.03
申请人 发明人
分类号 H01L21/331;H01L21/76;H01L21/8222;H01L27/082;H01L29/00;H01L29/732;H01L29/737 主分类号 H01L21/331
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