PATTERNING METHODS FOR STAIRCASE STRUCTURES AND FABRICATING METHODS FOR SEMICONDUCTOR DEVICES USING THE SAME

摘要

The present invention relates to a patterning method for forming a staircase structure and a manufacturing method of a semiconductor device using the same. The patterning method for forming a staircase structure comprises: forming a photoresist film on a process film; exposing the photoresist film to light by defocusing it; forming an etching mask having a staircase-shaped side surface by developing the exposed and defocused photoresist film; and forming the process film in a staircase structure by patterning the process film through an etching process using the etching mask.