| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound useful as an acid generator for a resist composition, the acid generator composed of the compound, the resist composition containing the acid generator, and a method for forming a resist pattern by using the resist composition. <P>SOLUTION: The resist composition includes a substrate component (A) changing solubility in an alkali developer by action of an acid; and an acid generator component (B) generating an acid by exposure to light. The acid generator component (B) contains an acid generator (B1) comprising a compound represented by general formula (b1-1) [wherein, R<SP>1</SP>is arylene or alkylene; and R<SP>2</SP>and R<SP>3</SP>are each independently aryl or alkyl]. <P>COPYRIGHT: (C)2010,JPO&INPIT |
