| 发明名称 |
INDIUM TARGET AND METHOD FOR PRODUCING SAME |
| 摘要 |
<p>Provided are an indium target that can favorably inhibit the occurrence of arcing, and a method for producing the indium target. The indium target having a surface arithmetic average roughness (Ra) of 1.6 µm or less.</p> |
| 申请公布号 |
EP2612952(B1) |
申请公布日期 |
2014.11.12 |
| 申请号 |
EP20110821373 |
申请日期 |
2011.05.12 |
| 申请人 |
JX NIPPON MINING & METALS CORPORATION |
发明人 |
MAEKAWA, TAKAMASA;ENDO, YOUSUKE |
| 分类号 |
C23C14/34;B22D7/00;B22D21/02;B22D31/00;B23D79/00 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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