| 摘要 |
<p>The present invention relates to an apparatus and a method of cleaning organic materials. More particularly, the present invention relates to an apparatus and a method of cleaning organic materials accumulated on a mask used for an organic deposition process. An apparatus of cleaning organic materials according to an embodiment of the present invention includes a plasma gas generation part which generates a plasma gas; a cleaning chamber which is connected to the plasma gas generation part and receives a mask; a gas injection part which is arranged in the cleaning chamber and sprays the plasma gas generated in the plasma gas generation part to the mask; and a cooling member which is arranged in the cleaning chamber and cools the mask.</p> |
