| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a method of forming a resist pattern using the resist composition. <P>SOLUTION: The resist composition contains: base material component (A) caused to change in solubility to an alkali developing liquid by the action of acid; an acid generator component (B) caused to generate acid by exposure; and a nitrogen-containing organic compound (D). The nitrogen-containing organic compound (D) contains a compound expressed by general formula (d1). In the formula, R<SP>1</SP>is a hydrocarbon group of 5C or more, and R<SP>2</SP>and R<SP>3</SP>are an aliphatic hydrocarbon group or -C(=O)-O-R<SP>1</SP>each may have a hydrogen atom and a substituent independently. The plurality of R<SP>1</SP>s in the formula may be the same or different and, R<SP>2</SP>and R<SP>3</SP>may be mutually bonded to form a ring. <P>COPYRIGHT: (C)2011,JPO&INPIT |
