Method for producing resist composition

摘要

Provided by the present invention is a method for producing a resist composition, especially a siliconcontaining resist underlayer film composition, with fewer film defects, the composition used in immersion exposure, double patterning, development by an organic solvent, and so forth. Specifically, provided is a method for producing a resist composition to be used for manufacturing a semiconductor device, wherein the resist composition is filtered using a filter which filters through 5 mg or less of an eluate per unit surface area (m 2 ) in an extraction using an organic solvent.