| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma light source capable of stably generating plasma light for EUV emission for a long time (on the order of μsec), reducing erosion of a center electrode tip part due to an arc discharge to greatly prolong the life of the part, and increasing the amount of supply of a plasma medium to increase the density of plasma. <P>SOLUTION: The plasma light source includes a pair of coaxial electrodes 10 disposed opposite to each other, a discharge environment holding device 20, and a voltage application device 30. The coaxial electrodes 10 each comprises a center electrode 12, a guide electrode 14 surrounding an opposite tip part of the center electrode, and an insulating member 16 for insulating the center electrode and guide electrode from each other. The center electrode 12 has a conductive porous part 12a including a tip part 11, and liquid metal comprising a plasma medium 6 seeps from the inside of the center electrode to the tip part 11 through the conductive porous part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
