Semiconductor device and a method for manufacturing a semiconductor device

摘要

A semiconductor device and a method for forming a semiconductor device are provided. The semiconductor device includes a semiconductor body with a first semiconductor region and a second semiconductor region spaced apart from each other. A first metallization is in contact with the first semiconductor region. A second metallization is in contact with the second semiconductor region. An insulating region extends between the first semiconductor region and the second semiconductor region. A semi-insulating region having a resistivity of about 103 Ohm cm to about 1014 Ohm cm is arranged on the insulating region and forms a resistor between the first metallization and the second metallization.

主权项

1. A semiconductor device, comprising:
a semiconductor body comprising, a first horizontal surface and a second horizontal surface arranged opposite the first horizontal surface, a first semiconductor region, a second semiconductor region and a third semiconductor region, the first semiconductor region and the second semiconductor region being arranged at the first horizontal surface and spaced apart from each other by a trench, the third semiconductor region being arranged at the second horizontal surface; a first metallization arranged on the first horizontal surface and in ohmic contact with the first semiconductor region; a second metallization arranged on the first horizontal surface and in ohmic contact with the second semiconductor region; a third metallization arranged on the second horizontal surface and in ohmic contact with the third semiconductor region and with the second metallization; an insulating region extending in the trench from the first semiconductor region to the second semiconductor region; and a semi-insulating region having a resistivity of about 103 Ohm cm to about 1014 Ohm cm, the semi-insulating region connecting the first metallization with the second metallization so as to form a resistor between the first semiconductor region and the third semiconductor region, the semi-insulating region being spaced apart from the semiconductor body by the insulating region.