Organic layer deposition apparatus

摘要

An organic layer deposition apparatus capable of reducing or minimizing shifting of a pattern, caused when a patterning slit sheet sags.

主权项

1. A method for forming an organic layer on a substrate by an organic layer deposition apparatus comprising a deposition source, a deposition source nozzle unit, and a patterning slit sheet, the method comprising:
disposing the deposition source nozzle unit at a side of the deposition source, the deposition source nozzle unit comprising a plurality of deposition source nozzles arranged in a first direction; disposing the patterning slit sheet to face the deposition source nozzle unit, the patterning slit sheet having a plurality of patterning slits arranged in a second direction perpendicular to the first direction; discharging a deposition material by the deposition source and through the deposition source nozzle unit and the patterning slit sheet to form the organic layer on the substrate, wherein the plurality of patterning slits comprise: a central patterning slit at a center of the patterning slit sheet; a plurality of left patterning slits disposed to a left of the central patterning slit; and a plurality of right patterning slits disposed to a right of the central patterning slit, wherein, when the patterning slit sheet is planar and rectangular in shape, the plurality of left patterning slits and the plurality of right patterning slits bend toward the central patterning slit.