发明名称 Transistors having features which preclude straight-line lateral conductive paths from a channel region to a source/drain region
摘要 Some embodiments include transistors having a channel region under a gate, having a source/drain region laterally spaced from the channel region by an active region, and having one or more dielectric features extending through the active region in a configuration which precludes any straight-line lateral conductive path from the channel region to the source/drain region. The dielectric features may be spaced-apart islands in some configurations. The dielectric features may be multi-branched interlocking structures in some configurations.
申请公布号 US8884368(B1) 申请公布日期 2014.11.11
申请号 US201313897112 申请日期 2013.05.17
申请人 Micron Technology, Inc. 发明人 Smith Michael A.
分类号 H01L29/66;H01L29/78;H01L29/10 主分类号 H01L29/66
代理机构 Wells St. John P.S. 代理人 Wells St. John P.S.
主权项 1. A transistor comprising: a channel region under a gate; a source/drain region laterally spaced from the channel region by an active region; one or more dielectric features extending through the active region in a configuration which precludes any straight-line lateral conductive path from the channel region to the source/drain region; and wherein the dielectric features are configured as spaced-apart interlocking structures.
地址 Boise ID US