发明名称 Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus
摘要 A vapor deposition apparatus and method for efficiently performing a deposition process to form a thin film with improved characteristics on a substrate, and a method of manufacturing an organic light-emitting display apparatus. The vapor deposition apparatus includes a chamber including an exhaust port; a stage disposed in the chamber, and including a mounting surface on which the substrate is to be disposed; an injection portion including at least one injection opening through which a gas is injected in a direction parallel with a surface of the substrate on which the thin film is to be formed; and a plasma generator disposed apart from the substrate to face the substrate.
申请公布号 US8883267(B2) 申请公布日期 2014.11.11
申请号 US201213431880 申请日期 2012.03.27
申请人 Samsung Display Co., Ltd. 发明人 Seo Sang-Joon;Huh Myung-Soo;Kim Seung-Hun;Kim Jin-Kwang;Song Seung-Yong
分类号 C23C16/04;C23C16/50;C23C16/458;C23C16/455 主分类号 C23C16/04
代理机构 Christie, Parker & Hale, LLP 代理人 Christie, Parker & Hale, LLP
主权项 1. A vapor deposition method of forming a thin film on a substrate, the vapor deposition method comprising: mounting the substrate on a mounting surface of a movable stage disposed in a chamber; injecting a source gas toward a space between the substrate and a movable plasma generator disposed to face the substrate via an injection portion and in a direction parallel with a surface of the substrate on which the thin film is to be deposited; performing an exhaust process by using an exhaust port of the chamber; generating plasma by using the plasma generator to discharge the plasma toward the substrate; performing another exhaust process by using the exhaust port of the chamber; and moving both the plasma generator and the stage with the substrate mounted thereon, wherein the mounting surface is positioned in parallel with a direction in which a gravitational force acts.
地址 Yongin-si KR