| 发明名称 | Illumination system and lithographic apparatus | ||
| 摘要 | An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements. | ||
| 申请公布号 | US8885144(B2) | 申请公布日期 | 2014.11.11 |
| 申请号 | US201113114652 | 申请日期 | 2011.05.24 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Claessens Bert Jan;Mulder Heine Melle;Van Der Veen Paul;Endendijk Wilfred Edward;Bouman Willem Jan;Van Drieënhuizen Bert Pieter;Verbeeck Jozef Ferdinand Dymphna;Dassen Marc Hendricus Margaretha;Hollink Thijs Johan Henry |
| 分类号 | G02B5/08;G03B27/32;G03B27/54;G03F7/20 | 主分类号 | G02B5/08 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. An illumination system comprising: an array of individually controllable optical elements, each element moveable between a plurality of orientations which may be selected in order to form desired illumination modes; and a controller to control orientation of one or more of the elements, the controller configured to determine, prior to incidence of a burst of radiation upon the one or more elements, a force to be applied to the one or more of the elements, which force at least partially compensates for force applied to the one or more elements by the burst of radiation incident upon the one or more elements, and cause application of the compensation force to the one or more elements. | ||
| 地址 | Veldhoven NL | ||