Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure

摘要

A photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer.

主权项

1. An ablation layer for a photosensitive resin for a relief printing, the ablation layer capable of being processed by infrared radiation, and the ablation layer comprising:
an anionic polymer comprising at least one group selected form the group consisting of a phosphoric acid group, a sulfonic acid group, a carboxylic acid group, and a phenolic hydroxyl group, and a polymer having an ester bond in a side chain and having a saponification degree of from 0% to 80%, which is at least one of polyvinyl alcohol and polyvinyl acetate; wherein the ablation layer can be removed with an aqueous developer.