发明名称 Plasma activated chemical vapour deposition method and apparatus therefor
摘要 In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode. In that way, the anode will include a portion that is shielded for direct coating with particles from the plasma formed and that hence will obtain e.g. substantially no dielectric coating at all.
申请公布号 US8883246(B2) 申请公布日期 2014.11.11
申请号 US200812747338 申请日期 2008.12.12
申请人 Plasmatrix Materials AB 发明人 Nicolescu Mihai;Hjalmarsson Äke;Kouznetsov Vladimir
分类号 C23C16/52;H01J37/32;C23C14/22;C23C14/34;C23C16/44;C23C16/515;H01J37/34 主分类号 C23C16/52
代理机构 Patent Portfolio Builders PLLC 代理人 Patent Portfolio Builders PLLC
主权项 1. A method of plasma activated chemical vapour deposition comprising the steps of: providing a vacuum vessel having an operating pressure or vacuum in the range of from 10−4 to 10 Torr, to which an operating gas including a mixture of a decomposition or precursor gas, a reactive gas and/or a sputter gas, is provided, providing a plasma decomposition unit in or connected to the vacuum vessel for decomposing the operating gas having complex molecules into charged or neutral radicals, the plasma decomposition unit having an anode and a cathode, the cathode having an enhancing magnetic field and being electrically insulated from the surrounding anode, providing a work piece processing unit including a processing chamber, the processing chamber being identical to the vacuum vessel, a portion thereof or connected thereto, providing a work piece in the processing chamber, applying periodically repeated voltage pulses having a single polarity between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit between the cathode and an inner surface of the surrounding anode of the plasma decomposition unit, thereby producing a plasma at a free surface of the cathode, comprising the additional step of: arranging the anode so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating so that the anode includes a surface portion shielded for direct coating with particles from the plasma formed wherein a tendency of transformation of a discharge from a glow discharge to an arc discharge is detected by appearance of high frequency oscillations of the discharge voltage.
地址 Stockholm SE