发明名称 |
Synthetic amorphous silica powder and method for producing same |
摘要 |
The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a granulated silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient between 1.35 exclusive and 1.75 inclusive obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity between 0.50 inclusive and 0.75 inclusive; and a spheroidization ratio between 0.20 inclusive and 0.55 exclusive. |
申请公布号 |
US8883110(B2) |
申请公布日期 |
2014.11.11 |
申请号 |
US201013520807 |
申请日期 |
2010.12.27 |
申请人 |
Mitsubishi Materials Corporation |
发明人 |
Ueda Toshiaki |
分类号 |
C01B33/158 |
主分类号 |
C01B33/158 |
代理机构 |
Edwards Wildman Palmer LLP |
代理人 |
Edwards Wildman Palmer LLP |
主权项 |
1. A synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a granulated silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm;
wherein the synthetic amorphous silica powder has: a quotient between 1.35 exclusive and 1.75 inclusive obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity between 0.50 inclusive and 0.75 inclusive; and a spheroidization ratio between 0.20 inclusive and 0.55 exclusive. |
地址 |
Tokyo JP |