Thin film deposition apparatus

摘要

A thin film deposition apparatus to form a fine pattern on a large substrate. The thin film deposition apparatus includes a deposition source, a first nozzle that is disposed at a side of the deposition source and includes a plurality of first slits, a second nozzle that is disposed opposite to the deposition source and includes a plurality of second slits, and a second nozzle reinforcement unit that is disposed on the second nozzle and crosses the second nozzle.

主权项

1. A thin film deposition apparatus comprising:
a deposition source; a first nozzle disposed at a side of the deposition source, the first nozzle having a length in a first direction and a width in a second direction substantially perpendicular to the first direction and including a plurality of first slits arranged along the first direction, the length and the width of the first nozzle being less than a length and a width, respectively, of a deposition target; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits elongated in the first direction and all of the second slits are arranged in a row along the second direction, a length of the second nozzle in the first direction being less than the length of the deposition target in the first direction and wherein a width of the second nozzle is substantially equal to a width of the target; and at least one second nozzle reinforcement unit disposed on the second nozzle and crossing the second slits, the thin film deposition apparatus being configured to be spaced from and movable with respect to the deposition target during deposition.