发明名称 THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE THIN-FILM TRANSISTOR
摘要 <p>According to one embodiment, a thin film transistor includes a gate electrode, a semiconductor layer, a gate insulating film, and a source electrode and a drain electrode. The semiconductor layer includes an oxide including at least one of gallium and zinc, and indium. The gate insulating film is provided between the gate electrode and the semiconductor layer. The source electrode and a drain electrode are electrically connected to the semiconductor layer and spaced from each other. The semiconductor layer includes a plurality of fine crystallites dispersed three-dimensionally in the semiconductor layer and has periodicity in arrangement of atoms.</p>
申请公布号 KR101460869(B1) 申请公布日期 2014.11.11
申请号 KR20127005869 申请日期 2009.09.04
申请人 发明人
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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