Method for forming pattern

摘要

A method for forming a pattern includes providing a composition to form a resist underlayer film on a surface of a substrate to be processed. The composition contains a calixarene based compound having a group represented by a following formula (i) bound to at least a part of an aromatic ring or at least a part of a heteroaromatic ring of the calixarene based compound. The resist underlayer film on the surface of the substrate is treated with heat or an acid. A resist pattern is formed on a surface of the resist underlayer film. The resist underlayer film and the substrate are etched using the resist pattern as a mask to form the pattern on the substrate. The dry-etched resist underlayer film is removed from the substrate with a basic solution.
—O—R1  (i)

主权项

1. A method for forming a pattern comprising the steps in the following order of:
providing a composition to form a resist underlayer film on an upper face side of a substrate to be processed, the composition containing a calixarene based compound having a group represented by a following formula (i) bound to at least a part of an aromatic ring or at least a part of a heteroaromatic ring of the calixarene based compound,
—O—R1  (i)wherein R1 represents a group that generates an acidic functional group by an action of heat or an acid;
forming a resist pattern on an upper face side of the resist underlayer film; etching the resist underlayer film and the substrate using the resist pattern as a mask to form the pattern on the substrate; and removing the etched resist underlayer film from the substrate with a basic solution, the method further comprising heating an entirety of the resist underlayer film when R1 represents a group that generates an acidic functional group by an action of heat, or generating an acid in an entirety of the resist underlayer film when R1 represents a group that generates an acidic functional group by an action of an acid, so that the acidic functional group is generated prior to removing the etched resist underlayer film.