发明名称 ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD.
摘要 An alignment sensor including an illumination source, such as a white light source, having an illumination grating operable to diffract higher order radiation at an angle dependent on wavelength; and illumination optics to deliver the diffracted radiation onto an alignment grating from at least two opposite directions. For every component wavelength incident on the alignment grating, and for each direction, the zeroth diffraction order of radiation incident from one of the two opposite directions overlaps a higher diffraction order of radiation incident from the other direction. This optically amplifies the higher diffraction orders with the overlapping zeroth orders.
申请公布号 NL2012694(A) 申请公布日期 2014.11.10
申请号 NL20142012694 申请日期 2014.04.25
申请人 ASML NETHERLANDS B.V. 发明人 BOEF ARIE;MATHIJSSEN SIMON;TINNEMANS PATRICIUS
分类号 G03F7/20;H01L21/68 主分类号 G03F7/20
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