发明名称 |
A LITHOGRAPHY APPARATUS, A DEVICE MANUFACTURING METHOD, A METHOD OF MANUFACTURING AN ATTENUATOR |
摘要 |
There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target. |
申请公布号 |
KR20140130169(A) |
申请公布日期 |
2014.11.07 |
申请号 |
KR20147025666 |
申请日期 |
2013.02.05 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOEKS MARTINUS;BLEEKER ARNO |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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