发明名称 |
Semiconductor Sensor Structures with Reduced Dislocation Defect Densities and Related Methods for the Same |
摘要 |
Non-silicon based semiconductor devices are integrated into silicon fabrication processes by using aspect-ratio-trapping materials. Non-silicon light-sensing devices in a least a portion of a crystalline material can output electrons generated by light absorption therein. Exemplary light-sensing devices can have relatively large micron dimensions. As an exemplary application, complementary-metal-oxide-semiconductor photodetectors are formed on a silicon substrate by incorporating an aspect-ratio-trapping technique. |
申请公布号 |
US2014327060(A1) |
申请公布日期 |
2014.11.06 |
申请号 |
US201414333204 |
申请日期 |
2014.07.16 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Cheng Zhiyuan;Fiorenza James;Sheen Calvin;Lochtefeld Anthony J. |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
1. A circuit structure comprising:
a transistor disposed in a substrate, the substrate comprising a first crystalline semiconductor material, the transistor comprising a first source/drain region disposed in the first crystalline semiconductor material and a gate structure disposed on the first crystalline semiconductor material; and a photo-sensor disposed in a second crystalline semiconductor material, the second crystalline semiconductor material being lattice mismatched to the first crystalline semiconductor material, the second crystalline semiconductor material being disposed at least partially in a recess of the first crystalline semiconductor material, the photo-sensor being electrically coupled to the gate structure of the transistor. |
地址 |
Hsin-Chu TW |