EXPOSURE SYSTEM, EXPOSURE METHOD AND MASK SUPPORT STRUCTURE

摘要

An exposure system, an exposure method and a mask plate support structure. The exposure system comprises: a support structure (5) used for supporting a mask plate (1), and a base stage (6) used for arranging a substrate (7), wherein the support structure (5) supports the mask plate (1), enabling the mask plate (1) to be obliquely set to an angle ofθrelative to a horizontal plane, and the base stage (6) supports the substrate (7) , enabling the substrate (7) parallel to the mask plate (1). This structure can effectively reduce the sag amount of the mask plate.