| 摘要 |
The embodiments of the present invention provide an array substrate, comprising: an base substrate; an active layer and a first transparent electrode which are arranged on the base substrate; and an etching blocking layer which is arranged on the active layer and is used for protecting a part of the active layer, wherein the active layer, the first transparent electrode and the etching blocking layer are formed by using a single pattern composition process and a single doping process, and the doped region and the first transparent electrode have the same material and are located on the same layer. |
