发明名称 A SYSTEM AND METHOD FOR MONITORING WAFER HANDLING AND A WAFER HANDLING MACHINE
摘要 Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor and includes control logic. The control logic is configured to store a reference output of the sensor when the wafer handling machine is aligned and is configured to generate an indication signal when a difference between the reference output and a current output of the sensor exceeds a threshold.
申请公布号 KR20140128861(A) 申请公布日期 2014.11.06
申请号 KR20140027372 申请日期 2014.03.07
申请人 GLOBALFOUNDRIES INC. 发明人 MINER STEPHEN BRADLEY;FOSNIGHT WILLIAM JOHN;GALLAGHER RYAN J.
分类号 H01L21/67;H01L21/66 主分类号 H01L21/67
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