RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide a resist composition capable of improving lithographic properties, a method of forming a resist pattern using the resist composition, and a compound useful as a resist composition.SOLUTION: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by the general formula (d0) in the figure. In the formula, Rrepresents a hydrocarbon group with 4 to 20 carbon atoms which may have a substituent; Yrepresents a divalent linking group; Rand Reach independently represent a substituent with 0 to 20 carbon atoms other than a fluorine atom, where one of Rand Rmay form a ring with Y; Mrepresents an m-valent organic cation; and m represents an integer equal to or greater than 1.