| 摘要 |
In one example, a reticle disclosed herein includes a body having a center, an arrangement of a plurality of exposure patterns, wherein a center of the arrangement is offset from the center of the body, and at least one open feature defined on or through the body of the reticle. In another example, a method is disclosed that includes forming a layer of photoresist above a plurality of functional die and a plurality of incomplete die, exposing the photoresist material positioned above at least one of the functional die and/or at least one of the incomplete die, performing an incomplete die exposure processes via an open feature of the reticle to expose substantially all of the photoresist material positioned above the plurality of incomplete die, and developing the photoresist to remove the portions of the photoresist material positioned above the incomplete die. |
