INJECT AND EXHAUST DESIGN FOR EPI CHAMBER FLOW MANIPULATION

摘要

The embodiments described herein generally relate to a flow control in a process chamber. The process chamber can include combinations of a flow control exhaust and a broad inject. The flow control exhaust and the broad inject can provide for controlled flow of process gases, as the gases both enter and leave the chamber, as well as controlling the gases already present in the chamber. Therefore, the overall deposition profile can be maintained more uniform.

主权项

1. A process chamber, comprising:
a chamber body; a substrate support disposed within the chamber body for supporting a substrate, the substrate support generally defining a processing region of the process chamber; and a broad inject in fluid connection with the processing region, the broad inject having a ring shape and comprising:
a centerline;a plurality of inject entrances;a plurality of inject paths in fluid connection with at least one of the plurality of inject entrances; anda plurality of inject ports in fluid connection with at least one of the inject paths.