| 摘要 |
<p>PROBLEM TO BE SOLVED: To enable efficient use of a component of at least one refraction subunit of a projection optical system.SOLUTION: A microlithography projection exposure system has a light source for illumination light. An illumination optical system functions to guide the illumination light to an object field of view in an object plane. A projection optical system 6 including at least one of curve mirrors M1 to M6 maps the object filed of view to an image field of view in an image plane 8. The projection optical system 6 has at least one refraction subunit 27 in an image formation beam path between an object plane 4 and the image plane 8. A reflection surface of at least one of the mirrors M1 to M6 of the projection optical system 6 is configured to be as a static free curve surface unexplainable by a rotational symmetric function. The projection exposure system enables a structural component of a fine structure to be formed. Across a cross section of the structural component, efficient use of a component of at least one refraction subunit of the projection optical system is enabled.</p> |
