PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD

摘要

A photo-curable composition having a high polymerization rate and a high polymerization conversion is provided. A patterning method having a high throughput is also provided.;A photo-curable composition contains a radical-polymerizable monomer (A), a photopolymerization initiator (B), and a compound (C) serving as a sensitizer and having the following general formula (1).;;X1 and X2 are selected from the group consisting of a hydrogen atom, alkyl groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. X1 and X2 may be the same or different. R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, alkyl groups, alkoxy groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. R1 to R10 may be the same or different.

主权项

1. A photo-curable composition, comprising: a radical-polymerizable monomer (A); a photopolymerization initiator (B); and a compound (C) serving as a sensitizer and having the following general formula (1): wherein X1 and X2 are independently selected from the group consisting of a hydrogen atom, substituted and unsubstituted alkyl groups, and substituted and unsubstituted aryl groups, R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, substituted and unsubstituted alkyl groups, substituted and unsubstituted alkoxy groups, and substituted and unsubstituted aryl groups, and X1 and X2 may be combined together to form a ring.