发明名称 |
TREATING LIQUID FOR ANALYSIS OF HIGH PURITY ORGANOMETALLIC COMPOUND AND ANALYSIS METHOD OF TRACE IMPURITY USING THE TREATING LIQUID, AND HIGH PURITY ORGANOMETALLIC COMPOUND THROUGH THE ANALYSIS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a treating liquid for analysis of a high purity organometallic compound suitable for using in analysis of trace decomposition impurities of a high purity organometallic compound; and also an analysis method of trace impurities in a high purity organometallic compound using the treating liquid.SOLUTION: The problems to be solved in the present invention is solved by a treating liquid for analysis of a high purity organometallic compound having a metal concentration of 0.001 to 1 mass% by using an aqueous acidic solution after decomposition treatment of the high purity organometallic compound with an aqueous inorganic acid solution and an organic solvent.</p> |
申请公布号 |
JP2014209119(A) |
申请公布日期 |
2014.11.06 |
申请号 |
JP20140090699 |
申请日期 |
2014.04.24 |
申请人 |
UBE IND LTD |
发明人 |
YAMANAKA EIJI;MIYAJI CHIHIRO |
分类号 |
G01N27/62;C07F3/02;C07F3/06;C07F5/00;C07F5/06;G01N31/00 |
主分类号 |
G01N27/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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