发明名称 |
METAL CONTACTS TO GROUP IV SEMICONDUCTORS BY INSERTING INTERFACIAL ATOMIC MONOLAYERS |
摘要 |
Techniques for reducing the specific contact resistance of metal-semiconductor (group IV) junctions by interposing a monolayer of group V or group III atoms at the interface between the metal and the semiconductor, or interposing a bi-layer made of one monolayer of each, or interposing multiple such bi-layers. The resulting low specific resistance metal-group IV semiconductor junctions find application as a low resistance electrode in semiconductor devices including electronic devices (e.g., transistors, diodes, etc.) and optoelectronic devices (e.g., lasers, solar cells, photodetectors, etc.) and/or as a metal source and/or drain region (or a portion thereof) in a field effect transistor (FET). The monolayers of group III and group V atoms are predominantly ordered layers of atoms formed on the surface of the group IV semiconductor and chemically bonded to the surface atoms of the group IV semiconductor. |
申请公布号 |
US2014327142(A1) |
申请公布日期 |
2014.11.06 |
申请号 |
US201214360473 |
申请日期 |
2012.10.18 |
申请人 |
ACORN TECHNOLOGIES, INC. |
发明人 |
Harrison Walter A;Clifton Paul A.;Goebel Andreas;Gaines R. Stockton |
分类号 |
H01L29/45;H01L21/283 |
主分类号 |
H01L29/45 |
代理机构 |
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代理人 |
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主权项 |
1. An electrical contact, comprising a metal and a group IV semiconductor separated by one of: (i) a monolayer of group V atoms; (ii) a monolayer of group III atoms; or (iii) one or more bi-layers, each bi-layer consisting of one monolayer of group V atoms and one monolayer of group III atoms at an interface between the metal and the group IV semiconductor, the atoms of the monolayer of group V or group III atoms or of each bi-layer of group V and group III atoms, respectively, being in epitaxial alignment with a lattice structure of the group IV semiconductor. |
地址 |
La Jolla CA US |