发明名称 NEGATIVELY CHARGED LAYER TO REDUCE IMAGE MEMORY EFFECT
摘要 An image sensor pixel includes a photodiode region having a first polarity doping type disposed in a semiconductor layer. A pinning surface layer having a second polarity doping type is disposed over the photodiode region in the semiconductor layer. A first polarity charge layer is disposed proximate to the pinning surface layer over the photodiode region. A contact etch stop layer is disposed over the photodiode region proximate to the first polarity charge layer. The first polarity charge layer is disposed between the pinning surface layer and the contact etch stop layer such that first polarity charge layer cancels out charge having a second polarity that is induced in the contact etch stop layer. The first polarity charge layer is disposed between a first one of a plurality of passivation layers and a second one of the plurality of passivation layers disposed over the photodiode region.
申请公布号 US2014327102(A1) 申请公布日期 2014.11.06
申请号 US201414331652 申请日期 2014.07.15
申请人 OMNIVISION TECHNOLOGIES, INC. 发明人 Rhodes Howard E.;Yang Dajiang;Chen Gang;Mao Duli;Venezia Vincent
分类号 H01L31/0224;H01L31/103 主分类号 H01L31/0224
代理机构 代理人
主权项 1. An image sensor pixel, comprising: a photodiode region having a first polarity doping type disposed in a semiconductor layer; a pinning surface layer having a second polarity doping type disposed over the photodiode region in the semiconductor layer, wherein the second polarity is opposite from the first polarity; a first polarity charge layer disposed proximate to the pinning surface layer over the photodiode region; a contact etch stop layer disposed over the photodiode region proximate to the first polarity charge layer, wherein the first polarity charge layer is disposed between the pinning surface layer and the contact etch stop layer such that first polarity charge layer cancels out charge having a second polarity that is induced in the contact etch stop layer; and a passivation layer disposed over the photodiode region between the pinning surface layer and the contact etch stop layer, wherein the passivation layer is one of a plurality of passivation layers disposed over the photodiode region, wherein a first one of the plurality of passivation layers is disposed between the pinning surface layer and the first polarity charge layer, and wherein a second one of the plurality of passivation layers is disposed between the first polarity charge layer and the contact etch stop layer.
地址 Santa Clara CA US